Photo : The RF Plasma Generator System The RF Plasma Generator System High-Speed Automatic Matching High Accuracy Plasma Generation The RF Plasma Generator System High-Speed Automatic Matching High Accuracy Plasma Generation
The JRC RF Plasma Generator System is developed to meet growing demand for new equipment that can produce advanced new products such as large-size semiconductor wafers and flat display panels. JRC created this new series taking advantage of years of experience in applying solid-state high power technologies to the development of high-power radio transmitters and broadcasting equipment that offer low maintenance, stable operation and high reliability. The JRC RF Plasma Generator System is developed to meet growing demand for new equipment that can produce advanced new products such as large-size semiconductor wafers and flat display panels. JRC created this new series taking advantage of years of experience in applying solid-state high power technologies to the development of high-power radio transmitters and broadcasting equipment that offer low maintenance, stable operation and high reliability.
Photo : The RF Plasma Generator System The JRC RF Plasma Generator System is developed to meet growing demand for new equipment that can produce advanced new products such as large-size semiconductor wafers and flat display panels. JRC created this new series taking advantage of years of experience in applying solid-state high power technologies to the development of high-power radio transmitters and broadcasting equipment that offer low maintenance, stable operation and high reliability. The JRC RF Plasma Generator System is developed to meet growing demand for new equipment that can produce advanced new products such as large-size semiconductor wafers and flat display panels. JRC created this new series taking advantage of years of experience in applying solid-state high power technologies to the development of high-power radio transmitters and broadcasting equipment that offer low maintenance, stable operation and high reliability.
Simultaneous adaptive control over RF and matching units -- high stability plasma state generation. Augmented heavy-duty power amplifier circuitry with a high-voltage power MOSFET -- higher output power with high destruction resistance. Open and short circuits to handle load and load impedance variation -- stable operation without conventional protection circuitry. A non-rotary vacuum variable capacitor -- high speed matching. A matching unit frequency-selective impedance detector -- more reliable and accurate automatic matching processes. To Features
To Specifications

RF Plasma Generator Developed with Radio Communications Technology.Customizable on Demand from a publication: Electronic Journal (june,2003)


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